Anwar Husain

In the United States, there are 25 individuals named Anwar Husain spread across 18 states, with the largest populations residing in California, Florida, Texas.

Public information about Anwar Husain

Resumes

Anwar Husain

Location:

Washington, DC

Industry:

Pharmaceuticals

Work:

Georgetown University
Employee-Lombardi Comprehensive Cancer Center

Education:

University of Louisville 2000 - 2007

Senior Staff Engineer

Location:

San Francisco, CA

Industry:

Semiconductors

Work:

Lam Research
Senior Staff Engineer

Data Scientist And Researcher

Location:

Washington, DC

Industry:

Hospital & Health Care

Work:

Hood College
Adjunct Professor - Computer Science Johns Hopkins Medicine Mar 2018 - Jun 2019
Postdoctoral Research Fellow Harrisburg University of Science and Technology Mar 2018 - Jun 2019
Corporate Faculty National Heart, Lung, and Blood Institute Mar 2018 - Jun 2019
Data Scientist and Researcher Cancervisit Mar 2018 - Jun 2019
Director - Precision Medicine and Informatics Georgetown Lombardi Comprehensive Cancer Center 2008 - 2011
Postdoctoral Research Fellow University of Louisville School of Medicine 2003 - 2007
Ruth L Kirschstein Nrsa M.d and Ph.d Predoctoral Fellow University of Louisville School of Medicine Aug 2000 - Dec 2000
Teaching Assistant University of Maryland Jan 1999 - May 1999
Teaching Assistant and Lecturer

Education:

College of Life Sciences Jun 2000
College of Life Sciences May 2000
College of Life Sciences 1998
College of Life Sciences 1997
College of Life Sciences 1996
College of Life Sciences
Bachelors, Bachelor of Science Montgomery College
Hood College
Master of Science, Masters, Computer Science Winston Churchill High School
The Johns Hopkins University School of Medicine
University of Louisville
Doctor of Medicine, Doctorates, Doctor of Philosophy, Toxicology, Pharmacology Georgetown University
Master of Science, Masters, Physiology University of Maryland
Bachelors, Bachelor of Science, Biochemistry, Computer Science

Skills:

Java, Python, Data Analysis, Databases, Bioinformatics, Computational Biology, Machine Learning, Statistical Data Analysis, Ruby, Ruby on Rails, Sql, C, Javascript, R, Molecular Biology, Research, Cell Culture, Life Sciences, Biochemistry, Immunohistochemistry, Science, Matlab, Numpy, Scipy, Artificial Intelligence, Cloud Computing, Oncology, Genomics, Cancer, Data Visualization, Amazon Web Services, Linux, Rnaseq, Ngs, Scientific Computing, Cancer Research, Statistics, Cancer Immunotherapy, Cell Biology, Computer Science, Data Mining, Data Science, Deep Learning, Deep Neural Networks, Unsupervised Learning, Supervised Learning

Tax Advisor

Location:

1347 63Rd Ter northwest, Margate, FL 33063

Industry:

Financial Services

Work:

The Tax Office
Tax Advisor

Education:

Florida Atlantic University 2000 - 2003
Bachelors, Bachelor of Business Administration, Management, Finance

Anwar A Husain

Location:

6609 Winfield Blvd, Margate, FL 33063

Erp Administrator

Location:

Dallas, TX

Industry:

Biotechnology

Work:

Implant Direct Sybron International
Erp Administrator Weir Oil and Gas Apr 2014 - Mar 2017
Senior It Business Analyst | Erp Administrator Triumph Group Apr 2011 - Apr 2014
Erp Specialist | Erp Administrator | Erp Analyst Dynamic Machine of Detroit Jan 2009 - Mar 2011
Business System Manager Perfekta Aerospace Mar 2003 - Dec 2008
System Administrator and Manager, Information Technology

Education:

Newman University 2010 - 2012
Master of Business Administration, Masters, Accounting, Finance Wichita State University 2000 - 2004
Bachelors, Bachelor of Business Administration, Management

Skills:

Information Technology, Business Analysis, Erp, Crystal Reports, Project Management, Process Improvement, Business Process, Visio, Integration, Access, Sharepoint, Ms Project, Sql, Microsoft Access, Business Process Improvement, Systems Analysis, Enterprise Resource Planning, Microsoft Exchange, Requirements Analysis, Business Intelligence, Sdlc, Microsoft Project, Software Development Life Cycle

Languages:

English
Bengali

Certifications:

Itil

Anwar Husain

Work:

Business Writer Abbot Vascular - Santa Clara, CA Oct 2010 to Dec 2010
Technical Writer TheStreet.com - New York, NY Apr 2006 to May 2007
Copy Editor TheStreet.com - New York, NY Dec 2000 to Apr 2001
Staff Reporter DiversityInc.com - New Brunswick, NJ Sep 2000 to Nov 2000
Reporter Northstar Interactive Research - New York, NY Jul 1999 to Aug 1999
Senior Research Analyst United Nations - New York, NY Dec 1989 to Dec 1990
Research Associate

Education:

The New School - New York, NY 1999
Certificate in Media Management Syracuse University - Syracuse, NY 1989
MBA in Finance University of Delhi - New Delhi, Delhi 1987
BA in History

Anwar Husain - Tempe, AZ

Work:

Triumph Aftermarket Services Group Apr 2011 to 2000
ERP Program Manager Dynamic Solutions - Wichita, KS Nov 2008 to Mar 2011
Project Manager, IT Perfekta Inc - Wichita, KS Mar 2003 to Oct 2008
Manager, Information Technology

Education:

Wichita State University - Wichita, KS
Bachelor of Business Administration in Accounting Newman University - Wichita, KS
MBA in Finance

Phones & Addresses

Name

Addresses

Phones

Anwar Husain

420 S Chatham Cir, Anaheim, CA 92806

Anwar A Husain

1115 Laguna Creek Ln, Pleasanton, CA 94566

925-484-2009

Anwar Husain

919 Dumaine Trce, Atlanta, GA 30328

Anwar A Husain

6310 Paseo Santa Maria, Pleasanton, CA 94566

925-484-2009

Anwar A Husain

853 Boardwalk Pl, Redwood City, CA 94065

650-592-9032

Anwar Husain

530 B St STE 1500, San Diego, CA 92101

Anwar A Husain

1347 63Rd Ter, Pompano Beach, FL 33063

Anwar A Husain

1891 81St Ave, Pompano Beach, FL 33068

Publications

Us Patents

Method For Using Generator For Foam To Clean Substrate

US Patent:

8557051, Oct 15, 2013

Filed:

Apr 12, 2012

Appl. No.:

13/445868

Inventors:

Arnold Kholodenko - San Francisco CA, US
Anwar Husain - Pleasanton CA, US
Gregory A. Tomasch - Kelseyville CA, US
Cheng-Yu (Sean) Lin - Sunnyvale CA, US

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

B08B 3/00
B05B 7/04

US Classification:

134 36, 134 37, 239 8, 239 9, 239 10, 239434, 2394345

Abstract:

A system for cleaning a substrate with a foam performs a method for generating a cleaning foam. In the first operation of the method, the system pumps a fluid into a premix chamber. The premix chamber is a component of a male plug which fits into a female housing in the system. Then the system injects a gas into the premix chamber to initiate generation of the foam from the fluid. The foam flows from the premix chamber into a sealed helical channel formed by a helical indentation on an outside surface of the male plug and an inner surface of the female housing to allow the foam to reach a desired state along a length of the sealed helical channel. In the last operation of the method, the foam outputs from an exit end of the helical channel through the male plug to a component of the system.

Single Substrate Processing Head For Particle Removal Using Low Viscosity Fluid

US Patent:

8584613, Nov 19, 2013

Filed:

Jun 30, 2008

Appl. No.:

12/165577

Inventors:

Arnold Kholodenko - San Francisco CA, US
Cheng-yu Lin - Sunnyvale CA, US
Leon Ginzburg - Santa Clara CA, US
Mark Mandelboym - Santa Clara CA, US
Gregory A. Tomasch - Kelseyville CA, US
Anwar Husain - Pleasanton CA, US

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

B05C 5/02

US Classification:

118313, 118315, 118411, 118412, 118429, 239550, 239553, 2395533, 2395535, 239554, 134198, 137561 A

Abstract:

A head for dispensing a thin film over a substrate is disclosed. The head includes a body assembly that extends between a first and a second end that is at least a width of the substrate. The body includes a main bore that is defined between the first and the second ends, the main bore connected to an upper side of a reservoir through a plurality of feeds that are defined between the main bore and the reservoir. The body also includes a plurality of outlets connected to a lower side of the reservoir and extend to an output slot. The plurality of feeds have a larger cross-sectional area than the plurality of outlets and the plurality of feeds are fewer than the plurality of outlets. Wherein fluid is configured to flow through the main bore, through the plurality of feeds along the bore and fill the reservoir up to at least the threshold level before fluid is evenly output as a film out of the output slot onto the substrate.

Apparatus For Transferring Semiconductor Substrates Using An Input Module

US Patent:

6406359, Jun 18, 2002

Filed:

May 31, 2000

Appl. No.:

09/583507

Inventors:

Manoocher Birang - Los Gatos CA
Brian J Brown - Palo Alto CA
Anwar Husain - Pleasanton CA
Michael N Sugarman - San Francisco CA

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

B24B 706

US Classification:

451 67, 451339

Abstract:

A system for polishing a semiconductor substrate. Specifically, the system includes one or more polishing modules and a cleaning module. A rail is disposed between the polishing modules and the cleaning module. The rail has a first end disposed proximate a transfer station disposed on the polishing module and a second end disposed proximate the cleaning module. A robot is movably disposed on the rail. The robot is adapted to transfer a substrate between the transfer station and the cleaning module. Additional embodiments of the invention include having the cleaning module in an orientation perpendicular to an orientation of the rail and having the cleaning module in an orientation perpendicular to an orientation of the rail.

Method And Apparatus For Controlling A Temperature Of A Wafer

US Patent:

6303895, Oct 16, 2001

Filed:

Jun 2, 2000

Appl. No.:

9/588122

Inventors:

Anwar Husain - Pleasanton CA
Hamid Noorbakhsh - Fremont CA

International Classification:

B23K 1000

US Classification:

2191214

Abstract:

A method and apparatus for controlling a temperature of a wafer during processing such as in a gas plasma or nonplasma environment wherein a wafer is positioned on a chuck. The wafer is heated and a pressurized gas is introduced into a space between the wafer and the chuck such that the pressurized gas transfers heat from the wafer to the chuck. Pressure of the pressuried gas is automatically varied such that heat transfer between the wafer and the chuck is varied in response to a difference between an actual wafer temperature and a desired wafer temperature to maintain the desired wafer temperature.

Characterization, Modeling, And Design Of An Electrostatic Chuck With Improved Wafer Temperature Uniformity

US Patent:

5548470, Aug 20, 1996

Filed:

Jul 19, 1994

Appl. No.:

8/277552

Inventors:

Anwar Husain - Pleasanton CA
David E. Kotecki - Hopewell Junction NY
Stephan E. Lassig - Poughkeepsie NY
Kurt A. Olson - Sebastopol CA
Anthony J. Ricci - Hopewell Junction NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H02N 1300

US Classification:

361234

Abstract:

An electrostatic chuck (ESC) provides increased temperature uniformity and adjustment capability of the surface of a wafer or wafer-like workpiece during processing, for example, in an electron-cyclotron-resonance chemical vapor deposition (ECR-CVD) reactor. Temperature uniformity is achieved through an improved pattern of grooves in the face of the ESC which allows an inert gas to be contained between the ESC and a wafer held thereby even at high levels of vacuum. The ESC is adapted for a particular desired temperature range by choice of surface roughness of the remaining areas of the face of the ESC. Adjustability within that range is achieved by variation of the electrostatic voltage by which a wafer is held against the chuck face.

Gripper For Supporting Substrate In A Vertical Orientation

US Patent:

6474712, Nov 5, 2002

Filed:

Apr 26, 2000

Appl. No.:

09/559889

Inventors:

Boris I. Govzman - Sunnyvale CA
Manoocher Birang - Los Gatos CA
Michael Sugarman - San Francisco CA
Anwar Husain - Pleasanton CA

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

B66C 100

US Classification:

294106, 414941, 901 30, 901 39

Abstract:

A gripper assembly is provided which supports a substrate in a vertical orientation. The gripper assemblys end effectors contact only the edge of the substrate. In a first aspect the end effectors each comprise a first pair of opposed surfaces and an second pair of opposed surfaces, all of which simultaneously contact the substrate, holding the substrate in a clamp-type manner. In a second aspect the end effectors each comprise a lower pair of opposed surfaces which simultaneously contact the substrate, and an upper pair of opposed surfaces, larger than the thickness of the substrate, which limit the substrate from horizontal tilting. In the second aspect the end effectors can close at a first elevation where they do not contact the substrate, and can then elevate to gently contact and support the substrate in a pocket-like manner. In a third aspect one of the end effectors has two pairs of opposed surfaces which simultaneously contact the substrate, and the other end effector has two pairs of opposed surfaces which limit the substrate from horizontal tilting. In any aspect no moving parts are required to limit the substrates vertical and horizontal movement.

Controlling The Temperature Of A Wafer By Varying The Pressure Of Gas Between The Underside Of The Wafer And The Chuck

US Patent:

6140612, Oct 31, 2000

Filed:

Jun 7, 1995

Appl. No.:

8/474009

Inventors:

Anwar Husain - Pleasanton CA
Hamid Noorbakhsh - Fremont CA

Assignee:

Lam Research Corporation - Fremont CA

International Classification:

F27B 514

US Classification:

219390

Abstract:

A method and apparatus for controlling a temperature of a wafer during processing such as in a gas plasma or nonplasma environment wherein a wafer is positioned on a chuck. The wafer is heated and a pressurized gas is introduced into a space between the wafer and the chuck such that the pressurized gas transfers heat from the wafer to the chuck. Pressure of the pressurized gas is automatically varied such that heat transfer between the wafer and the chuck is varied in response to a difference between an actual wafer temperature and a desired wafer temperature to maintain the desired wafer temperature.

Method Of In-Situ Cleaning Of A Chuck Within A Plasma Chamber

US Patent:

5911833, Jun 15, 1999

Filed:

Jan 15, 1997

Appl. No.:

8/784852

Inventors:

Dean Denison - San Jose CA
William Harshbarger - San Jose CA
Anwar Husain - Pleasanton CA
C. Robert Koemtzopoulos - Hayward CA
Felix Kozakevich - Sunnyvale CA
David Trussell - Fremont CA

Assignee:

LAM Research Corporation - Fremont CA

International Classification:

B44C 122

US Classification:

134 11

Abstract:

A method for in-situ cleaning of a chuck that bears a semiconductor wafer in a semiconductor manufacturing machine maintains a processing chamber in a sealed condition with the chuck inside the chamber. A wafer bearing surface of the chuck is exposed upon determining that the chuck requires a cleaning. A cleaning gas is then injected into the chamber and RF power is applied to the chamber to create a plasma that cleans the wafer bearing surface. Since the processing chamber is maintained in a sealed condition during the in-situ cleaning of the chuck, the time required to clean the chuck and prepare the chamber for continued production runs is greatly reduced.

Videos & Images

FAQ: Learn more about Anwar Husain

What is Anwar Husain date of birth?

Anwar Husain was born on 1951.

What is Anwar Husain's email?

Anwar Husain has such email addresses: ahusa***@yahoo.com, ahus***@earthlink.net, ahus***@attb.com, anwarhus***@hotmail.com, deadlyfang***@aol.com, anw***@netzero.net. Note that the accuracy of these emails may vary and they are subject to privacy laws and restrictions.

What is Anwar Husain's telephone number?

Anwar Husain's known telephone numbers are: 301-279-9754, 954-461-7954, 650-592-9032, 212-725-0235, 212-726-0924, 714-986-3917. However, these numbers are subject to change and privacy restrictions.

How is Anwar Husain also known?

Anwar Husain is also known as: Anwar H Husain, Munawar Husain. These names can be aliases, nicknames, or other names they have used.

Who is Anwar Husain related to?

Known relatives of Anwar Husain are: Harris Husain, Munawar Husain, Omar Husain, Zahid Husain, Asif Husain, Ershad Hussain, Pamela Husainali. This information is based on available public records.

What are Anwar Husain's alternative names?

Known alternative names for Anwar Husain are: Harris Husain, Munawar Husain, Omar Husain, Zahid Husain, Asif Husain, Ershad Hussain, Pamela Husainali. These can be aliases, maiden names, or nicknames.

What is Anwar Husain's current residential address?

Anwar Husain's current known residential address is: 9208 Winterset Dr, Potomac, MD 20854. Please note this is subject to privacy laws and may not be current.

What are the previous addresses of Anwar Husain?

Previous addresses associated with Anwar Husain include: 8732 Nw 76Th Dr, Ft Lauderdale, FL 33321; 919 Dumaine Trce, Atlanta, GA 30328; 530 B St Ste 1500, San Diego, CA 92101; 252 E 33Rd St Apt 4F, New York, NY 10016; 20800 Homestead Rd, Cupertino, CA 95014. Remember that this information might not be complete or up-to-date.

Where does Anwar Husain live?

Walnut Creek, CA is the place where Anwar Husain currently lives.

How old is Anwar Husain?

Anwar Husain is 72 years old.

Ages	35 to 80
Phones	301-279-9754	954-461-7954	650-592-9032
Addresses	9208 Winterset Dr, Potomac, MD 20854	8732 Nw 76Th Dr, Ft Lauderdale, FL 33321	919 Dumaine Trce, Atlanta, GA 30328
Business records	Co-Founder and Owner / Smashtech	Lead Architect - Salesforce / Verizon Telematics Inc.	Erp Administrator / Implant Direct Sybron International

Anwar Husain

What do we know about Anwar Husain

Public information about Anwar Husain

Resumes

Resumes

Anwar Husain

Senior Staff Engineer

Data Scientist And Researcher

Tax Advisor

Anwar A Husain

Erp Administrator

Anwar Husain

Anwar Husain - Tempe, AZ

Phones & Addresses

Publications

Us Patents

Method For Using Generator For Foam To Clean Substrate

Single Substrate Processing Head For Particle Removal Using Low Viscosity Fluid

Apparatus For Transferring Semiconductor Substrates Using An Input Module

Method And Apparatus For Controlling A Temperature Of A Wafer

Characterization, Modeling, And Design Of An Electrostatic Chuck With Improved Wafer Temperature Uniformity

Gripper For Supporting Substrate In A Vertical Orientation

Controlling The Temperature Of A Wafer By Varying The Pressure Of Gas Between The Underside Of The Wafer And The Chuck

Method Of In-Situ Cleaning Of A Chuck Within A Plasma Chamber

FAQ: Learn more about Anwar Husain

Possible Relatives